BVL Provides Process-Reliable High-Purity Cleaning for Components
During rinsing, it is decided whether high-purity components reach the required cleanliness limits or whether recontamination after cleaning leads to scrap. Three factors are particularly critical: ultra-pure water quality directly at the point of use (particles, organics/TOC, conductivity, pH); minimal carryover between process stages and a clearly defined rinsing strategy; and plant engineering and loop hygiene (suitable materials, well-designed piping and continuous monitoring).
In high purity component cleaning, cleanliness requirements are more demanding: permissible limits for the chemical composition of the component surface in atomic percent, extremely low outgassing rates and particle freedom in the submicron range.
These requirements result from extreme vacuum conditions in which the components are used, for example in EUV lithography, aerospace, or mass spectrometers for analytical applications.
In these environments, cleanliness is a system characteristic.
The process chain must be designed to deliver technical cleanliness reliably and to prevent recontamination. Every contact medium must meet the same limits so the specification is not compromised. Otherwise, either the required cleanliness cannot be achieved or the component is re-contaminated after cleaning.
For ambient air and process air, limit values are generally manageable using cleanroom technology and HEPA/ULPA filtration.
Process water is often far more challenging. In rinsing, it must not introduce particles or organic residues onto the component otherwise, recontamination and scrap may occur.

